Projection Exposure Device "MRS Series" adopts UV-LED light source.
Wafer size post-process projection exposure equipment MRS adopts UV-LED light source as the standard light source (enabling reduction of running costs without sacrificing productivity!)
■ For 8 inches and below, "single exposure method" is available, while for 12 inches, "step and repeat exposure method" can be selected. ■ Achieves high productivity due to a wide exposure area. ■ Has a deep focal depth, with numerous achievements in the MEMS and RF filter industries. ■ Compatible with TAIKO wafers. ■ Global alignment method. ■ High-precision alignment exposure is achieved with a high-rigidity frame. ■ Focus map mechanism is standard equipment.
- 企業：サーマプレシジョン
- 価格：Other
